Japanese advanced logic semiconductor manufacturer Rapidus Corporation today announced the delivery and installation of ASML’s EUV lithography machine at its Innovative Manufacturing (IIM-1) foundry, an advanced semiconductor development and manufacturing facility currently under construction in Hokkaido.

This is an important milestone for the Japanese semiconductor industry, marking the first time that EUV lithography machines have been used for large-scale mass production in the country. In addition to EUV machines, Rapidus will also install some additional advanced semiconductor manufacturing equipment at its IIM-1 foundry, as well as a fully automated material handling system to optimize 2nm GAA semiconductor manufacturing.

EUV is one of the key technologies for realizing 2nm semiconductors. Advanced photolithography processes are critical to forming the 2nm GAA structure.

The latest generation of EUV lithography uses laser sources, optical systems and photomasks that are much more precise than previous generations. ASML’s EUV lithography machine installed at the Rapidus IIM-1 foundry uses advanced optical systems.

The pilot will begin at IIM-1 Rapidus in April 2025. Single-wafer processes will be introduced for all manufacturing equipment, and Rapidus will begin building a new semiconductor foundry service called Rapid and Unified Manufacturing Service (RUMS).